Miscellaneous Process Chemicals

Defoamer A (RD-28) For full aqueous resist strippers. Cost-effective and free rinsing
Developer Defoamer (RD-43) For Carbonate based developers. Non-sludging, non-clogging, free rinsing.
In-Process Defoamer (RD-36) General purpose, water soluble. Can be used for any process application.
Silicone Defoamer (RD-71) Concentrated, cost effective, for waste water applications only.

HAL Flux (RD-88) A cost-effective high performance flux, complete coverage, cold water rinseable.
ChemStrip 99 (RD-37) Accelerator, fume suppressant, for Nitric Acid rack strippers.
Equipment Cleaner (RD-34) For complete cleaning of metal and resist residues from developers, strippers, etc..
MaskStrip (RD-85) A "safe solvent" for total cleaning of screens
TerClean (RD-01) A general purpose orange Terpene based cleaner.
Developer EC-1 (RDZ-1607) For Full Aqueous Dry Film Photoresists.
Developer EC-2 (RDZ-1608) For Full Aqueous Dry Film Photoresists.
Developer EC-3 (RDZ-1609) Sodium Carbonate Monohydrate.
Defoamer EC-D (RDZ-1610) Free Rinsing for Photoresist Developers.
Defoamer EC-S (RDZ-1611) To Defoam ResiStrip™ EC-1.
Defoamer EC-S2 (RDZ-1612) Free Rinsing for use in Photoresist Strippers or other Spray Systems.